Crystal technology overcomes [CaF.sub.2] carriers. (Lithography).(Single Crystal Technologies L.L.C., crystal research)(Brief Article)(Statistical Data Included)

Semiconductor International, December, 2001 by Hand, Aaron

Hot on the heels of solidifying patent coverage of its core technologies, a startup company has revealed crystal growth and purification techniques that have the potential to wipe away most doubts about the readiness of calcium fluoride ([CaF.sub.2]) optics for 157 nm lithography. The industry has determined that [CaF.sub.2] is the most suitable optical lens material to deal with 157 nm sources, but many still question whether there will be enough quality material to meet the demand for lithography systems.

The uncertainty that remains isn't surprising when current [CaF.sub.2] growth techniques provide a yield of about 3%. Despite continued announcements from crystal suppliers about factory expansions and increased capacity, the trifling yields that are...

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