CD measurement system. (Product Preview).

Semiconductor International, July, 2003

MicroLine 500 critical dimension measurement system provides automated measurement of overlay patterns on semiconductor wafers. The system uses a robotic loader to handle cassettes of up to 300 mm wafers. Measurement repeatability is 2-5 nm (3[sigma]), and accuracy (TIS) is <5 nm. Application programs included with the system are written using Measurement Control Language (MCL). This text-based language controls all functions. Program files are easy to read and allow users to modify existing programs or to create their own programs to control system operation. Micro-Metric, San Jose, www.micro-metric.com.

Booth 3045-SF