Princeton Teams Advance Nanoimprint Understanding.

Semiconductor International, March, 2007

Aaron Hand, Executive Editor, Electronic Media

With two recent papers in the journal Nanotechnology, researchers at Princeton University (Princeton, N.J.) have published important advances in nanoimprint lithography (NIL), taking the technique a couple of steps further toward feasibility as a next-generation lithography (NGL) option in mainstream semiconductor manufacturing.

The researchers in both cases were led by Stephen Y. Chou, Joseph C. Elgin Professor of Engineering and the head of Princeton's NanoStructure Laboratory. Chou invented NIL in the 1990s, and has since founded Nanonex Corp. (Monmouth Junction, N.J.) to commercialize the technique. In the Jan. 17 issue of Nanotechnology, Chou and others from Princeton and Nanonex revealed...

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