SEM/TEM.

Semiconductor International, May, 2009

Staff

The JEM-ARM200F atomic resolution analytical microscope offers aberration-corrected S/TEM technology. It achieves a high-angle annular darkfield (HAADF-STEM) resolution of 80 pm (0.08 nm). The system enables both atom-by-atom imaging resolution and spatial resolution for atom-to-atom chemical mapping of materials, including energy-dispersive X-ray spectroscopy (EDS) and electron energy-loss spectroscopy (EELS). It offers stability for imaging and analysis at the sub-nm scale. A shielding design safeguards the ultrahigh-powered optics from airflow, vibration and acoustical interference, and additional shielding ensures protection from electronic interference, magnetic fields and thermal fluctuations. JEOL USA Inc. , Peabody, Mass., www.jeolusa.com