Magnetron sputtering system developed for nonmetals.

Advanced Materials & Processes,  November, 2001  

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A magnetron sputtering system for nonmetals that retains the speed and economy of conventional magnetron sputtering, while allowing real-time control of the stoichiometry and particle energy of the depositing films, has been reported by Solar Associates, Merritt Island, Fla. In the new system, microwaves reduce the sputter plasma voltage to between 30 and 100 electron volts.

These levels do not cause negative ion bombardment damage to semiconductors or other fragile materials. Deposition rates remain as high ...

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