Silicon architecture etched at low cost for high-power fuel cells.(METALS)

Advanced Materials & Processes,  June, 2005  

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A high-rate, low-cost method for anisotropically etching silicon by an electrochemical process has reportedly been developed by NanoSciences Corp., Oxford, Conn., for fuel cell applications. A new silicon architecture may allow fuel cells to enter the commercial mainstream as power sources for next-generation portable electronic devices.

The process is for fabricating microchannel plates (MCPs) on silicon wafers. The silicon MCPs could be used to detect ultraviolet emissions for missile defense. While the electrochemical process can create silicon MCPs, it may also be applied to ...

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