Manufacturing Industry
Evanescent wave lithography images 26 nm device geometry.(TESTING/CHARACTERIZATION)
Advanced Materials & Processes, April, 2006
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A new computer chip lithography method has led to imaging capabilities beyond that previously thought possible, report researchers at Rochester Institute of Technology, Rochester, N.Y. Known as evanescent wave lithography, the technology is said to be capable of optically imaging the smallest-ever semiconductor device geometry.
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The technology has enabled imaging rendered to 26 nanometers--a size previously possible only via extreme ultraviolet wavelength, says Prof. Bruce Smith. By capturing images that ...
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