Veeco Instruments' Newest Microetch Ion-Beam Etch System Features World's Largest RFICP Ion Source; Next-Generation Model Gains Rapid Market Acceptance As Veeco Collects Orders for 10 Systems to Date

Business Wire, May 21, 1996

PLAINVIEW, N.Y.--(BUSINESS WIRE)--May 21, 1996--The next generation of Veeco Instruments' industry-leading Microetch ion-beam etching systems, featuring the world's largest RF, inductively coupled plasma (RFICP) ion source, is now available.

Production systems began shipping in the first quarter, and Veeco has received orders for more than 10 systems to date.

The Microetch RF-1201 incorporates Veeco's RIM-350 ion source, measuring 300 mm (12 inches) in diameter. In addition to etching a large area at once, the large diameter ion source provides uniformity of /-3 percent across a processing area measuring 250 mm in diameter.

The new system's uptime performance, maintenance requirements and throughput are all improved over Veeco's previous ion-beam etching equipment. Specifications vary with the type of material being etched.

"In comprehensive beta-site qualification tests, the Microetch RF-1201 has proven itself to be a highly dependable and productive processing tool," said Emmanuel N. Lakios, vice president and general manager of Veeco's Microetch product line. "Its advanced design and low RF-frequency operation provide contamination-free and precise high-aspect-ratio etching at twice the etch rate of its predecessor systems."

With its family of Microetch systems, Veeco controls more than 50 percent of the global equipment market for etching thin-film heads used in disk drives. The company has installed more than 600 systems worldwide.

While the new system's primary market is etching thin-film heads, its applications in semiconductor manufacturing include anisotropically patterning virtually any microelectronic material or stack of materials including PZT (lead zirconium titanate), BST (barium strontium titanate), III-V compounds and etch-resistant inert metals including copper, gold and platinum.

The Microetch RF-1201's ion source operates at a low, 1.8-MHZ frequency, generating an exceptionally stable beam which supports all reactive process capabilities. In addition, uptime is high because the ion source has no filament to burn out and require replacement.

Veeco's RIM-350 ion source uses an advanced, three-grid, highly transparent set of beam optics, which provides excellent collimation for optimal control of sidewall etching angles from 10 degrees to 90 degrees. The long-life grid design yields highly efficient beam extraction and energy control.

In addition, the RIM-350's auto-matching, inductive coupling technique provides high-efficiency plasma generation, eliminating sputtering of the plasma chamber for ultraclean, high MTBF (mean time before failure) ion beam processing.

The Microetch RF-1201 has a list price of $350,000 to $500,000, depending on options. Availability is 10-33 weeks after receipt of order.

Veeco Instruments Inc. (NASDAQ:VECO), headquartered in Plainview, is a worldwide leader in precision ion beam etching and deposition systems as well as surface metrology and industrial measurement equipment for microelectronics applications such as semiconductors, thin-film magnetic heads and flat panel displays.

Global sales and service offices are located in the United States, Europe and the Asia-Pacific market.

CONTACT: Veeco Instruments Inc.

Fran Brennen, 516/349-8300 ext. 222

or

Mathews & Clark

Bruce Hokanson, 360/574-5780