Genus Introduces Two Ion Implanters with the Highest MeV Yields, a Broad Energy Range and the Lowest Operating Costs in Industry; Kestrel 650 Targets Traditional High-Energy Implants; Kestrel 750 Aims at More Aggressive Applications

Business Wire, July 15, 1997

SAN FRANCISCO--(BUSINESS WIRE)--July 15, 1997--Genus Inc. (NASDAQ:GGNS) a leading supplier of high energy (MeV) ion implant technology to the semiconductor industry, today unveiled two new ion implant systems that enable manufacturers to achieve the industry's highest MeV yields, a broad energy range and the lowest operating costs.

These two systems, the Kestrel 650(TM) and Kestrel 750(TM), are evolutionary tools based on Genus' Tandetron(TM) 1520 implanter, which the company leveraged in recent years to bring MeV technology into mainstream manufacturing for process simplification. The Kestrel 650 is targeted at traditional, high energy ion implant applications such as retrograde twin wells.

The Kestrel 750 is optimized for more aggressive MeV applications, such as triple wells and the Genus patented BILLI (Buried Implanted Layer for Lateral Isolation) structure, through a broader energy range and higher beam currents.

"Genus has more than 10 years of focused experience in the design, manufacture and service of hardware that best meets the unique requirements of high-energy ion implantation," said Dr. John O'Connor, marketing vice president of Genus' ion technology products group. "Kestrel implanters offer device makers the simplest, most practical and real MeV production solution available on the market," he said.

The Kestrel systems offer the industry's highest yields by virtue of several process enhancing features. First, by offering continuous and direct real-time high voltage verification, Kestrel provides guaranteed, programmed energy on target. Second, the system's large process chamber features direct cryopumping to maintain chamber pressure below the critical threshold during implants involving photoresist.

Kestrel implanters have been redesigned to accept new cryopump technology. Both systems come standard with two 250MMF cryopumps with the option of utilizing 400mm cryos, which more than double the system's process chamber pumping speed. This ensures the maximum beam current will be maintained while minimizing dose shift, even for the most aggressive application requirements.

To further promote yield increases, the system features backside only, all-in-vacuum wafer handling, limiting particles to fewer than 0.05 average adders per square centimeter for particles greater than 0.16 micron in size. This enables the industry's highest yields for processes of 0.25 micron and below.

Low cost-of-ownership is also an important feature of the Kestrel implanter family. First, the systems offer the industry's smallest footprint, compared with competing tools. The 46 percent difference in required fab floor space results in maximum savings and layout flexibility.

Another cost-saving feature is the system's efficient use of power. Little energy is wasted and water cooling requirements are low, compared with competitors. The system also offers fast and automated beam tuning providing superior handling of chained implants for the highest throughputs.

Dataquest, the market research firm, sees this market segment as one of the equipment industry's fastest-growing. The firm is forecasting better than 26 percent compound annual growth rate for high energy implant sales, to a market size of more than $481 million by the year 2001. Genus is well-positioned to handle significant market growth at its recently completed, state-of-the-art implanter manufacturing facility in Newburyport, Mass.

Founded in 1982, Genus Inc. develops, manufactures, markets and services advanced thin film deposition and high energy (MeV) ion implantation equipment used in the fabrication of advanced semiconductor devices.

The company's customers include semiconductor manufacturers located throughout the United States, Europe and the Pacific Rim, including Japan, Korea and Taiwan. Genus' corporate offices are located at 1139 Karlstad Dr., Sunnyvale, CA 94089; telephone, 408/747-7120; fax, 408/747-7199; e-mail, PR@genus.com; Internet, www.genus.com . -0-

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CONTACT: Genus Inc.

Nancy Ellickson, 408/747-7120

nellickson@genus.com

or

Mathews & Clark

Walt Mathews, 408/736-1120

wmathews@mathewsandclark.com