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Intel's Transistor Technology Breakthrough Represents Biggest Change to Computer Chips in 40 Years

Business Wire, Jan 27, 2007

Because the high-k gate dielectric is not compatible with today's silicon gate electrode, the second part of Intel's 45nm transistor material recipe is the development of new metal gate materials. While the specific metals that Intel uses remains secret, the company will use a combination of different metal materials for the transistor gate electrodes.

The combination of the high-k gate dielectric with the metal gate for Intel's 45nm process technology provides more than a 20 percent increase in drive current, or higher transistor performance. Conversely it reduces source-drain leakage by more than five times, thus improving the energy efficiency of the transistor.

Intel's 45nm process technology also improves transistor density by approximately two times that of the previous generation, allowing the company to either increase the overall transistor count or to make processors smaller. Because the 45nm transistors are smaller than the previous generation, they take less energy to switch on and off, reducing active switching power by approximately 30 percent. Intel will use copper wires with a low-k dielectric for its 45nm interconnects for increased performance and lower power consumption. It will also use innovative design rules and advanced mask techniques to extend the use of 193nm dry lithography to manufacture its 45nm processors because of the cost advantages and high manufacturability it affords.

Penryn Family Will Bring More Energy Efficient Performance

The Penryn family of processors is a derivative of the Intel Core microarchitecture and marks the next step in Intel's rapid cadence of delivering a new process technology and new microarchitecture every other year. The combination of Intel's leading 45nm process technology, high-volume manufacturing capabilities, and leading microarchitecture design enabled the company to already develop its first working 45nm Penryn processors.

The company has more than 15 products based on 45nm in development across desktop, mobile, workstation and enterprise segments. With more than 400 million transistors for dual-core processors and more than 800 million for quad-core, the Penryn family of 45nm processors includes new microarchitecture features for greater performance and power management capabilities, as well as higher core speeds and up to 12 megabytes of cache. The Penryn family designs also bring approximately 50 new Intel SSE4 instructions that expand capabilities and performance for media and high-performance computing applications.

Intel, the world leader in silicon innovation, develops technologies, products and initiatives to continually advance how people work and live. Additional information about Intel is available at www.intel.com/pressroom.> (Note to Editors: Listen to and watch recorded interviews with Intel engineers and designers on the "Manufacturing" channel at http://intel.feedroom.com.)

Intel, Core, Xeon and the Intel logo are trademarks or registered trademarks of Intel Corporation or its subsidiaries in the United States and other countries.


 

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