Manufacturing Industry

Texas researchers claim dry-etch copper process - The Fab Line - Brief Article

Electronic News, April 1, 2002 by Jeff Chappell

TWO CHEMICAL ENGINEERS AT TEXAS A&M UNIVERSITY, YUE KUO and Sangheon Lee of the Thin Film Microelectronics Laboratory, have developed a method for dry etching copper, the university announced recently. Kuo and Lee have developed a dry-etch process in which the products of the plasma-copper reaction are easily removed by dipping the semiconductor wafer in a dilute acid solution and dissolving the byproducts, Texas A&M said.

The process can be carried out using commercial equipment under the same conditions as conventional copper processing, the researchers said.

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