Akrion's Akros features concentration feedback chemical control - The Fab Line - wet bench tool for process control - Brief Article - Product Announcement

Electronic News, August 5, 2002

WAFER SURFACE PREP TOOL COMPANY AKRION'S LATEST wet bench tool, Akros, features a patent-pending chemical concentration feedback system for greater process control, according to the company. Designed for sub-100nm processes, Akros can handle all front-end-of-line cleans and pre-epitaxial deposition preparation, Akrion said.

Akros' chemical concentration feedback system can improve particle removal rates and etch uniformity by allowing users to manipulate the chemical ratio of each specific process recipe, enabling them to extract incremental improvements in performance, the company said. Akros has a footprint of 6.35 square meters and a mean time between failures of about 2,000 hours.