Manufacturing Industry
Numerical Technologies and Shipley partner for resist optimization with phase-shifting - The Fab Line - Brief Article
Electronic News, Nov 11, 2002
NUMERICAL TECHNOLOGIES INC. AND SHIPLEY CO. LLC ARE working together to improve resist performance with alternating aperture phase-shift masks on 248nm lithography 7 equipment for feature sizes of less than 100nm. This will help develop further processes for advanced SOC, memory and logic devices, according to the companies.
Shipley said the partnership is crucial for extending deep-ultraviolet lithography beyond conventional limits and meeting the industry roadmap for 90nm technology by using a combination of advanced photomask technology and resist optimization.
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COPYRIGHT 2002 Gale Group
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